Plasma properties in high power impulse magnetron sputtering
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چکیده
.....................................................................................................I PREFACE.......................................................................................................III PAPERS INCLUDED IN THE THESIS ........................................................... V RELATED PUBLICATIONS NOT INCLUDED IN THE THESIS.................... VI ACKNOWLEDGEMENTS ............................................................................ VII CONTENTS ................................................................................................... IX VARIABLES AND CONSTANTS .................................................................. XI
منابع مشابه
Effects of Deposition Temperature on the Properties of ZnO Films Grown by High Power Impulse Magnetron Sputtering
Thin film of zinc oxide (ZnO) has widely applied in many devices, such as solar cells[1], photoelectric devices[2], ferroelectric devices[3] owing to two most important properties: the direct wide bandgap of 3.37 eV at room temperature[4], and the large exciton binding energy of 60 meV[5]. As reported in the literature, the ZnO thin films have been prepared by various techniques, such as sol-ge...
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The total energy flux in a high power impulse magnetron sputtering (HiPIMS) plasma has been measured using thermal probes. Radial flux (parallel to the magnetron surface) as well as axial flux (perpendicular to the magnetron surface) were measured at different positions, and resulting energy flux profiles for the region between the magnetron and the substrate are presented. It was found that th...
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Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at pulsing frequencies of 250 Hz and 1 kHz. Films are also deposited by direct current magnetron sputtering (dcMS), for reference. In both HiPIMS and dcMS cases, unipolar pulsed negative bias voltages up to 150 V are applied to the substrate to tune the energy of the positively charged ions that bomb...
متن کاملTime and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres
Mass spectroscopy was used to analyze the energy and composition of the ion flux during high power pulsed magnetron sputtering (HIPIMS/HPPMS) of a Cr target in an industrial deposition system. The ion energy distribution functions were recorded in the time-averaged and time-resolved mode for Ar + , Ar 2+ , Cr + , Cr 2+ , N2 + and N + ions. In the metallic mode the dependence on pulse energy (eq...
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In this study, the effect on thin film growth due to an anomalous electron transport, found in high power impulse magnetron sputtering (HiPIMS) has been investigated for the case of a planar circular magnetron. An important consequence of this type of transport is that it affects the way ions are being transported in the plasma. It was found that a significant fraction of ions are transported r...
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